Cutting-edge Atomic Force Microscopy techniques for large and multiple samples
Ultimate imaging quality with build-in acoustic and vibration isolation, active thermostabilization, industry lowest 25 fm/√Hz optical beam deflection sensor noise and unique design of scanning-by-tip system allow routine high resolution imaging.
Equipped with 50+ AFM modes including HybriD mode: all cutting-edge nanomechanical, electrical and magnetic studies are available in basic configuration.
Automated study of samples arrays by user-defined scenario with database image storage.
Up to 200×200 mm and 40 mm in height samples inspection in any point with 1 μm positioning accuracy.
Smart ScanT™ software for one-click optimization of scanning parameters. This is not just an algorithm, it is rather a unique companion that helps a newcomers in AFM to get industry quality images and assists the experts.
Wide possibilities of customization: integration of addition optical equipment, OEM sample holders, automation of measurement and data analysis procedures according to your requirements.
VEGA is the first AFM that brings industry standard automation to all users:
High-resolution measurements require exceptional level of acoustic and vibration isolation of AFM working environment. Build-in acoustic enclosure and active anti-vibration system makes VEGA perfect for demanding AFM studies.
Thermal drift is a challenging issue for high-resolution and long-term measurements especially for largesample AFMs with massive mechanical parts. Unique design of build-in fan-free enclosure provides VEGA with capability to operate at conditions of extraordinary temperature stability within 0.05 oC. This guarantees the exceptional low thermal drift of less than 0.2 nm/min.
HOPG atomic resolution, 6×6 nm
Our unique 100x100 um closed-loop scanner and control electronics design allow atomic resolution and less than 30 pm topography measurement noise.
850 nm non-coherent superluminescent diode (SLD) source and special optical scheme design assures the lowest 25 fm/√HZ OBD sensor noise among commercial large-sample AFMs.
OEM sample holders
VEGA mechanical design allows fast exchange and three-point mount of sample holder. Upon your request we can develop unique:
Additional optical equipment:
This equipment can be integrated and correlated with AFM probe position thanks to 1 μm sample XY-positioning accuracy.
Automation of measurement and data analysis procedures
Our software engineers can develop unique automation algorithms according to your requirements.
Better than 30 nm MFM spatial resolution, ultimate signal-to-noise ratio and 200×200 mm XY motorized stage makes VEGA a perfect tool for data storage inspection.
Contact AFM: Topography, Lateral Force, Force Modulation, Spreading Resistance Imaging
Amplitude modulation AFM: Topography, Phase, Feedback
HybriD mode AFM: Topography, Young’s modulus, Work of Adhesion, Viscoelectisity, Current, Piezoresponse Force Microscopy, Fast Force Volume
AFM spectroscopy: Force-distance, Amplitude-distance, Phase-distance, I(V), I(Z)
Magnetic Force Microscopy: Two-pass and Frame Lift DC/AC
Electrostatic Force Microscopy: Single-pass and Two-pass Amplitude Modulation, Frequency Modulation
Scanning Capacitance Force Microscopy: Single-pass and Two-pass Amplitude Modulation, Frequency Modulation (dC/dZ and dC/dV imaging)
Kelvin Probe Force Microscopy: Single-pass and Two-pass Amplitude Modulation, Phase Modulation
Piezoresponse force microscopy & Switching Spectroscopy
Nanolithography: Voltage, Current, Force
200x200 mm XY motorized stage together with low-noise scanningby-tip system and variety of nique NT‑MDT SI AFM cantilevers allow failure and roughness analysis of large and heavyweight amples with 30 pm vertical esolution. This feature is now available for users of any skills thanks to automated scanning parameters adjustment.
Powerful set of surface characterization modes like Kelvin Probe, Magnetic Force, Piezoresponse Force microscopy, Capacity and Conductivity mapping makes VEGA AFM irreplaceable tool for research and control applications in a field of modern micro- and nanoelectronics, MEMS, NEMS and data storage.
Customizable easy-to-exchange sample holders allow variety of applications including wafer inspection, multiple samples study etc.
Mechanical design and control software of VEGA AFM was developed to make frequent AFM measurements easy and time-effective. Fully automated operation, user interface for serial AFM measurements, database image storage and customizable sample holder allow to setup and simply investigate any array of samples.
Standard AFM head for traditional AFM probes. Enables operation with the majority of commercial probes
Type: tube scanner with closed loop sensors. Scanning by tip
Scanning range, XYZ: 100×100×10 µm or 2×2×1 µm in Low Voltage Mode
Closed loop: Available for all Directions: XYZ
Drive electronics noise <5 µV/√Hz
Type: motorized sample positioning in XYZ
XYZ thermal drift: Less than 0.2 nm/min
Moving range: 200×200 mm in XY, 30 mm in Z
Positioning accuracy: 1 µm in XY, 0.2 µm in Z
Positioning speed: 8 mm/sec in XY
Navigation: automated multiple scanning by user-defined scenario, by video image, 3D mouse compatible
Approach: smart soft approach algorithm
Light source: 850 nm SLD with FC single mode fiber, optional LDM and SLD sources of different wavelengths
Optical system adjustment: automated
Optical beam deflection sensor noise: <25 fm/√Hz above 50 kHz
Type: motorized focus, digital zoom and XY positioning. Correlated with sample and laser position
Resolution: 0,98 μm
Field of view: up to 1.2×0.8 mm (5 Mpixel)
Autofocus: on cantilever, on sample
Variety of sample holders
150 V bias voltage extension
Signal Access Module
AFM probes: probe holder supports most commercially available probes
Number of scan channels: up to 24
Signal processing: 512 Mb buffer Size, 3x 340 MHz FPGA, 320 MHz DSP
Lock-in amplifiers: 2x analog lock-in amplifiers, 3x digital lock-in amplifiers (Multifrequency AFM modes supporting)
Generators: 6x 32 bit digital generators, 4x for Lock-in
BV: +/- 10 V AC and DC (independent sample and tip voltage supply), +/- 150 V AC and DC (optional)
Self-testing: automated performance check
Scanning parameters auto adjustment: drive amplitude, lock-in gain, setpoint, feedback gain, scanning rate
Automatic configuration of advanced modes
Automation Features: optical system adjustment, multiple scanning on 200×200 mm range by user-defined scenario, overlay of optical and AFM images, panoramic optical view, place of interest saving, autofocus on cantilever, autofocus on sample
Programming tools: Nova PowerScript language, LabView integration, Database integration
Database storage of obtained images
PC interface: USB
Temperature stabilization: build-in fan free thermal stabilization with 0.05 °C accuracy
Acoustic isolation: build-in acoustic enclosure
Vibration isolation: build-in active vibration isolation table
Contact mode: Topography, Lateral Force, Force modulation, Spreading Resistance, Piezoresponse Force Microscopy, Contact Resonance Microscopy
Amplitude modulation mode: Topography, Phase Imaging, Single- and Two-pass Kelvin Probe Force Microscopy with Phase and Amplitude Modulation, Two-pass and Frame Lift Magnetic Force Microscopy, Single- and Two-pass Electrostatic Force Microscopy, Single- and Two-pass Scanning Capacitance Force Microscopy (dC/dZ and dC/dV imaging)
HybriD mode: Topography,Young's modulus QNM for 104 to 1011 Pa, Work of Adhesion QNM, Force Volume, Current, Piezoresponse, Viscoelasticity, Kelvin Probe Force Microscopy with Phase and Amplitude Modulation, Magnetic Force Microscopy, Electrostatic Force Microscopy, Scanning Capacitance Force Microscopy (dC/dZ and dC/dV imaging)
Nanolithography: Voltage, Current, Force (All Vector and Raster)
Spectroscopy: Force-, Amplitude-, Phase-, Frequency-, Current-Distance, I(V), Piezopulse, Custom mode
W×L×H: 810×610×1450 mm
